In an interesting announcement, Intel and IBM have developed the supposed “biggest change in semiconductors in over 40 years”. I’m a little dubious about that claim, however, when looking at the diagram, I notice that they use a high K dialectric for their gate material. I thought everyone was all hyped up on low K stuff. Or am I getting my transistor structure totally confused here. Perhaps someone from a highly respected competitor would care to chime in?
Ah I see. I just need to do some research on wikipedia. High-K good for transistor gate material. Low-K good for interconnect material. Hrm, but really? 40 years?